Development of a photolithographic process for selective-area deposition of ordered CdTe polycrystal arrays
This thesis will focus exclusively on the design, experimental procedures and analysis of patterned SiO2 surfaces and the selective growth of the CdTe layer. Current results reinforce the initial work done on selective deposition of CdTe on patterned surfaces by Terrazas. The study will concentrate on the transition from the shadow mask process using copper grids which results in the “inverse” structure to the implementation of a photolithographic technique using a photoresist, mask, exposure tool, and lift-off development to obtain the “non-inverted” structure. The patterning size of the growth mask was reduced to achieve a one micron feature size. Optical and electron microscopy, atomic force microscopy, x-ray diffraction, and low-temperature photoluminescence were utilized to characterize the patterned samples and the selective-area growth of CdTe. (Abstract shortened by UMI.)^
Engineering, Electronics and Electrical|Engineering, Materials Science
Lopez, Cesar O, "Development of a photolithographic process for selective-area deposition of ordered CdTe polycrystal arrays" (2005). ETD Collection for University of Texas, El Paso. AAI1427725.